5 July 2000 High-repetition-rate ultranarrow-bandwidth 193-nm excimer lasers for DUV lithography
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Results on the feasibility of highest repetition rate ArF lithography excimer lasers with narrow spectral bandwidth of less than 0.4 pm are presented. The current 193 nm lithography laser product NovaLine A2010 delivers output power of 10W at 2 kHz repetition rate with energy dose stability of +/- 0.5 percent. A novel 193 nm absolute wavelength calibration technique has ben incorporated in the laser which gives absolute wavelength accuracy better than 0.5 pm. Long-term results of optical materials, coatings and laser components give insight into estimated cost of ownership developments for the laser operation over the next years. Progress in pulse stretching approaches to achieve lower stress of the wafer scanner illumination optics and lens allow optimistic estimates of total system CoO. Initial results on the laser operation at 4 kHz in order to reach 20W output power are discussed.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Uwe Stamm, Uwe Stamm, Rainer Paetzel, Rainer Paetzel, Igor Bragin, Igor Bragin, Juergen Kleinschmidt, Juergen Kleinschmidt, Peter Lokai, Peter Lokai, Rustem Osmanov, Rustem Osmanov, Thomas Schroeder, Thomas Schroeder, Martin Sprenger, Martin Sprenger, Wolfgang Zschocke, Wolfgang Zschocke, } "High-repetition-rate ultranarrow-bandwidth 193-nm excimer lasers for DUV lithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388976; https://doi.org/10.1117/12.388976


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