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5 July 2000 Impact of high-order aberrations on the performance of the aberration monitor
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Abstract
The aberration ring test is used to determine the low and high order lens aberrations. The method is based on two key elements: the linear response of ART to aberrations and the use of multiple imaging conditions. Once the model parameters are determined by means of simulations, the Zernike coefficients are solved from a set of linear equations. The Zernike coefficients thus obtained are correlated to interferometric lens data and to line width measurements.
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Peter Dirksen, Casper A. H. Juffermans, Andre Engelen, Peter De Bisschop, and Henning Muellerke "Impact of high-order aberrations on the performance of the aberration monitor", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389010
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