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5 July 2000 Implementation of an automated feedback focus control methodology for Nikon (NSR) i-line and DUV steppers and scanners
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Abstract
Accurate and precise metrology and control for stepper or scanner objective lens focal-length is critical for sub- 0.25micrometers design-rule photolithography, specifically for CD, isolated-dense offset, and resist sidewall control of minimum feature geometries. As next generation processes result in reduction of the manufacturing process latitudes, contribution of the focus metrology error will continue to consume a larger portion of the useable depth of focus. In addition to improvement of the cross-field photoresists image fidelity, if the focal length measurement precision is improved, lithographic rework and device yield implications, due to mask and imaging linewidth error, are minimized in production.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ivan Lalovic, Joseph T. Parry, Brett Gwynn, and Christopher D. Silsby "Implementation of an automated feedback focus control methodology for Nikon (NSR) i-line and DUV steppers and scanners", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389073
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