Improving image control by correcting the lens-heating focus drift

Bwo-Jung Cheng; Hsiang-Chung Liu; Yuanting Cui; Jiyou Guo

doi:10.1117/12.389075

5 July 2000 Improving image control by correcting the lens-heating focus drift

Bwo-Jung Cheng, Hsiang-Chung Liu, Yuanting Cui, Jiyou Guo

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389075
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

A robust characterization procedure of the focus drift during the lens heating effect is introduced. Through the optimized lens heating factors, we could keep the better wafer image control when exposure. Result in better critical dimension uniformity across wafer and across one field. This paper will present a detailed optimization procedure for lens heating and the benefit to fix the edge and alterative yield loss. There are several methods to characterize the total focus drift during exposure and how to keep the best focus of the image to the center of the focal plan deviation to get the more better image printing control. These methods including the image sensor scan, measurement the alignment offset of the focal mark, exposure-defocus window and CD measurement. The focus drift could be exactly compensated base on the different saturated data and keep the BF in the center of the FPD.

Citation Download Citation

Bwo-Jung Cheng, Hsiang-Chung Liu, Yuanting Cui, and Jiyou Guo "Improving image control by correcting the lens-heating focus drift", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389075

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