5 July 2000 Linewidth uniformity error analysis for step-and-scan systems
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The analysis proposed attempts to identify the systematic and non-systematic errors in linewidth uniformity data and their magnitudes. Specific to step-and-scan systems are various error components to linewidth such as optical slot errors, stage scan errors and wafer residual errors. We explore ways of handling these errors and applying developed methods to actual micrascan data in order to understand how to improve linewidth control.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John D. Zimmerman, John D. Zimmerman, Javed Sumra, Javed Sumra, Y.K. Arif Leong, Y.K. Arif Leong, Pradeep K. Govil, Pradeep K. Govil, Greg H. Baxter, Greg H. Baxter, } "Linewidth uniformity error analysis for step-and-scan systems", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389071; https://doi.org/10.1117/12.389071

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