5 July 2000 Modified proximity function for OPC in laser direct writing
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Based on the energy conservation law, a modified proximity function is proposed to describe the absorbed energy distribution in photoresist during laser writing. The measured data for photoresist absorbing energy are fitted well to the modified proximity function. We analyze the proximity effect in laser writing by using the new model, it is helpful to further develop the precompensation and multi- exposure methods to correct proximity effects in laser direct writing.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jinglei Du, Jinglei Du, Fuhua Gao, Fuhua Gao, Yixiao Zhang, Yixiao Zhang, Yongkang Guo, Yongkang Guo, Chunlei Du, Chunlei Du, Zheng Cui, Zheng Cui, "Modified proximity function for OPC in laser direct writing", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388940; https://doi.org/10.1117/12.388940


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