New silica glass (AQF) for 157-nm lithography

Yoshiaki Ikuta; Shinya Kikugawa; T. Kawahara; H. Mishiro; Noriaki Shimodaira; Shuhei Yoshizawa

doi:10.1117/12.388990

5 July 2000 New silica glass (AQF) for 157-nm lithography

Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Noriaki Shimodaira, Shuhei Yoshizawa

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388990
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Projection photolithography at 157 nm is now under research as a possible extension of current 248 nm and planned 193 nm technologies. We have succeeded in the development of the modified fused silica glass 'AQF' for 157 nm lithography. In this paper, we present the performance of the newest material; AQF/Ver. 2.1. Transmission and its uniformity at 157 nm is better than 78 +/- 1.5 percent, and birefringence is within 2nm. The surface flatness is less than 0.5 micrometers , and surface defects over 0.4 micrometers in size are free.

Citation Download Citation

Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Noriaki Shimodaira, and Shuhei Yoshizawa "New silica glass (AQF) for 157-nm lithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388990

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