5 July 2000 Prospects for long-pulse operation of ArF lasers for 193-nm microlithography
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Abstract
The phenomenon of compaction of fused silica is a major concern in 193nm lithography. Numerous studies have shown that as a result, the cost-of-operation of 193nm lithography is expected to be significantly higher than at 248nm due to the degradation of scanner optics. Recent studies have also shown that compact could be reduced by increasing the pulse length of the ArF laser since the magnitude of compaction reduced as 1/(Tis)0.6. Here, Tis is the integral square pulse duration and is given.
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Thomas Hofmann, Thomas Hofmann, Bruce Johanson, Bruce Johanson, Palash P. Das, Palash P. Das, } "Prospects for long-pulse operation of ArF lasers for 193-nm microlithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389039; https://doi.org/10.1117/12.389039
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