5 July 2000 Scalable pattern generator data path: for the future
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Abstract
With the shrinking design rules for semiconductors mask data complexity increases continuously. The increasing use of OPC, which has become common for advanced masks, reinforces this trend. The requirements on data processing increase and make it a possible bottleneck. Increasing write times directly impact the cost of the photomask. These facts raise the question of how to design a data path that will not limit the writing speed and throughput of a pattern generator.
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Charlotta Johansson, Charlotta Johansson, Lars Ivansen, Lars Ivansen, Anders Thuren, Anders Thuren, Per Liden, Per Liden, Mans Bjuggren, Mans Bjuggren, } "Scalable pattern generator data path: for the future", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389055; https://doi.org/10.1117/12.389055
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