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5 July 2000 Self-sustaining dose control system: ways to improve the exposure process
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Abstract
In the semiconductor equipment business, self-metrology calls for in-situ measurements and diagnostics of the process parameters. For exposure tools, self-diagnostics and self-tuning are the core features. The present paper discusses a dose control system that allows for monitoring, correction and periodic self-calibration of the litho tool. Creation of such a system becomes a task even more complex in view of the aggressive illumination environment - 193 and 157 nm - that makes most traditional optical materials inapplicable; and causes many that are applicable to have time-varying performance.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gregory J. Kivenzor "Self-sustaining dose control system: ways to improve the exposure process", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389077
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