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5 July 2000 Simpler attenuated phase-shifting mask
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Abstract
The structure, principle and manufacturing process of a single layer attenuated phase-shifting mask which is compatible with the traditional Cr mask fabrication technology are introduced in the paper. Partial experimental results are provided.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jin Zhang, Boru Feng, Desheng Hou, Chongxi Zhou, HanMin Yao, Yongkang Guo, Fen Chen, Fang Sun, and Ping Su "Simpler attenuated phase-shifting mask", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388954
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