5 July 2000 Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography
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Abstract
We have developed a KrF excimer laser with ultra narrow linewidth and high repetition rate applicable for optical lithography using DUV wafer scanners with highest numerical aperture (NA) of more than 0.8. A laser bandwidth of less than 0.4 pm, full width half maximum, is achieved by our new design of the laser resonator, which is based on out patented polarization coupled resonator. The new resonator design increase the efficiency of ht laser optics and improves the wavelength stability. The laser tube and solid sate pulser have been adapted to the new laser resonator. As a result, another step in the reduction of the cost of operation is achieved. The laser operates with a repetition rate of 2 kHz and gives a large operation range with respect to wavelength and energy range. The characteristic performance of this new excimer laser is presented.
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Rainer Paetzel, Rainer Paetzel, Hans Stephen Albrecht, Hans Stephen Albrecht, Vadim Berger, Vadim Berger, Igor Bragin, Igor Bragin, Matthias Kramer, Matthias Kramer, Juergen Kleinschmidt, Juergen Kleinschmidt, Marcus Serwazi, Marcus Serwazi, } "Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388985; https://doi.org/10.1117/12.388985
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