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29 December 1999 Extreme-UV lithography: a candidate for next-generation lithography
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Proceedings Volume 4016, Photonics, Devices, and Systems; (1999) https://doi.org/10.1117/12.373596
Event: Photonics Prague '99, 1999, Prague, Czech Republic
Abstract
We present a short overview of optical designs for projection systems to be used in Extreme UV lithography, a technique that is considered to be one of the potential successors to classical optical lithography. Typical state- of-the-art designs are presented with special emphasis on the peculiarities of ring-field projection systems. The specific properties of some new design developed by the present author will be discussed.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph J. M. Braat "Extreme-UV lithography: a candidate for next-generation lithography", Proc. SPIE 4016, Photonics, Devices, and Systems, (29 December 1999); https://doi.org/10.1117/12.373596
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