Soft x-ray narrow-band laser plasma sources for nanotechnology

Ronan Faulkner; Gerard D. O'Sullivan; Dave O'Reilly; Padraig Dunne

doi:10.1117/12.375441

25 January 2000 Soft x-ray narrow-band laser plasma sources for nanotechnology

Ronan Faulkner, Gerard D. O'Sullivan, Dave O'Reilly, Padraig Dunne

Proceedings Volume 4064, Third International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering; (2000) https://doi.org/10.1117/12.375441
Event: Third International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, 1999, St. Petersburg, Russian Federation

Abstract

The emission from laser produced plasma has been employed as a source of soft X-ray radiation for nanotechnology. By incorporating high Z elements into low Z solid hosts, targets have been fabricated which, when illuminated with high power Nd:YAG laser pulses, emit a significant proportion of the incident energy in a narrow wavelength region, with reduced continuum emission in the adjacent spectrum. Such a source would be of considerable utility in a projection lithography setup, where the presence of multilayer optics prevents the use of broadband soft X-ray sources. Cesium, barium and cerium were incorporated into different targets, resulting in different peak wavelengths for the emission. 4d - 4f transitions in highly ionized species have been identified as being responsible for the narrow emission feature. In addition, efforts to reduce particulate debris from the target are reported.

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Ronan Faulkner, Gerard D. O'Sullivan, Dave O'Reilly, and Padraig Dunne "Soft x-ray narrow-band laser plasma sources for nanotechnology", Proc. SPIE 4064, Third International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (25 January 2000); https://doi.org/10.1117/12.375441

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KEYWORDS

Plasma

X-rays

Barium

Cesium

Tin

Ions

Nd:YAG lasers

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