High-energy femtosecond oscillators and their application for laser ablation of dielectric materials

Vladislav V. Yakovlev

doi:10.1117/12.407394

16 August 2000 High-energy femtosecond oscillators and their application for laser ablation of dielectric materials

Vladislav V. Yakovlev

Author Affiliations +

Proceedings Volume 4065, High-Power Laser Ablation III; (2000) https://doi.org/10.1117/12.407394
Event: High-Power Laser Ablation, 2000, Santa Fe, NM, United States

Abstract

High-energy oscillators, generating femtosecond pulses at 800 nm and 1250 nm, are demonstrated. These pulses are used for fast-speed laser ablation and material modification of transparent dielectric materials. Sub-micron size features are produced in fused silica by tight focusing of these pulses.

Citation Download Citation

Vladislav V. Yakovlev "High-energy femtosecond oscillators and their application for laser ablation of dielectric materials", Proc. SPIE 4065, High-Power Laser Ablation III, (16 August 2000); https://doi.org/10.1117/12.407394

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