Translator Disclaimer
19 July 2000 Current status of NGL masks
Author Affiliations +
Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392098
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan
Abstract
The manufacture of Next Generation Lithography reticles presents many challenges. Extremely small critical dimension and image placement error budgets; novel substrates including membranes and multi-layer reflective coatings; and inspection, detection and repair of subresolution defects will force revolutionary change in the infrastructure of mask technology. This paper surveys current NGL mask designs, structures, materials and manufacturing capabilities. Results from mask fabrication, physical modeling, error budget analysis and extensive experience in building X-Ray membrane masks are presented to develop process learning plans to meet future product specifications.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David M. Walker "Current status of NGL masks", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392098
PROCEEDINGS
11 PAGES


SHARE
Advertisement
Advertisement
Back to Top