19 July 2000 Development of photomask process with precise CD control, and an approach for DFM (defect-free manufacturing) using a cluster tool
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Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392030
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan
Abstract
Specifications for advanced photomask are becoming more and more stringent as the industry shifts to smaller lithography nodes. Among various requirements for photomasks, the need for stringent mean to target (MTT) control of critical dimensions (CDs) as well as the reduction of defects is the hottest issue for current photomask manufacturers. In this paper a unique photomask manufacturing method for precise CD-MTT control is described and an approach to defect free manufacturing (DFM) is also proposed. In the new method, a two-step compensation to cancel CD errors is adopted. Its essence is the selection of metrology tools used in each step. An MTT of +/- 5nm is achieved using this method. For DFM, a cluster tool, combining the processing tools with each other by a robot handler, has been installed and avoiding human handling is proved to be a correct way.
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Shiho Sasaki, Toshifumi Yokoyama, Masa-aki Kurihara, Hiroyuki Miyashita, Naoya Hayashi, Hisatake Sano, "Development of photomask process with precise CD control, and an approach for DFM (defect-free manufacturing) using a cluster tool", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392030; https://doi.org/10.1117/12.392030
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