19 July 2000 Fogging effect compensation technique for photomask making
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Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392057
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan
Abstract
We investigated a new method for decrease of CD disparity due to fogging effect at photomask making, utilizing side- wall-angle-dependence of CD loss through descum process. We demonstrated this method could be valid for less than half- micron. This method can be effective on condition of anisotropic descum, no 'foot' at post-descum, and just- or under-development. Using this method, we obtained CD uniformity of 18.6 over fogging and non-fogging field, including process error.
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Yuji Nozaki, Toshiyuki Tanaka, Katsuhiro Takushima, Seki Suzuki, Akihiro Endo, Kohei Sogo, Yasuki Kimura, "Fogging effect compensation technique for photomask making", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392057; https://doi.org/10.1117/12.392057
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