19 July 2000 Pellicle degradation and its effect on surrounding environment in ArF lithography
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Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392067
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan
Abstract
We investigated pellicle degradation during ArF laser irradiation and its effect on a substrate. The chemical structure of the pellicle film was not changed but its molecular weight decreased. F and C were observed on the substrate surface after irradiation. The source of the contamination was apparently film evaporation caused by ArF laser irradiation. Further experiments under conventional conditions, not accelerated conditions, will be necessary.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junji Miyazaki, Junji Miyazaki, Takashi Okagawa, Takashi Okagawa, Keisuke Nakazawa, Keisuke Nakazawa, Toshiro Itani, Toshiro Itani, Shigeto Shigematsu, Shigeto Shigematsu, Hiroaki Nakagawa, Hiroaki Nakagawa, } "Pellicle degradation and its effect on surrounding environment in ArF lithography", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392067; https://doi.org/10.1117/12.392067
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