Quality assurance and yield improvement in photomask fabrication

Takashi Yamauchi

doi:10.1117/12.392029

19 July 2000 Quality assurance and yield improvement in photomask fabrication

Takashi Yamauchi

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392029
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

Photomask used in aspect of semiconductor is called on 'No.0 process in wafer' or 'Key-parts', so that we are required to make it with Hi-reliability and Hi-quality level. On the other hand, its problem that cost of Photomask Fabrication jumps because machine price, inspection tool, and inspection steps in leading-edge are increasing. For decreasing what we call 'cost of quality assurance', its policy is significant that quality management in photomask production line is equal quality assurance in photomask, in addition improvement process capability. This report clears the requirement of customer, specification, and the problem, introduces quality assurance and yield improvement in photomask fabrication.

Citation Download Citation

Takashi Yamauchi "Quality assurance and yield improvement in photomask fabrication", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392029

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