19 July 2000 Quality assurance and yield improvement in photomask fabrication
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Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392029
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan
Abstract
Photomask used in aspect of semiconductor is called on 'No.0 process in wafer' or 'Key-parts', so that we are required to make it with Hi-reliability and Hi-quality level. On the other hand, its problem that cost of Photomask Fabrication jumps because machine price, inspection tool, and inspection steps in leading-edge are increasing. For decreasing what we call 'cost of quality assurance', its policy is significant that quality management in photomask production line is equal quality assurance in photomask, in addition improvement process capability. This report clears the requirement of customer, specification, and the problem, introduces quality assurance and yield improvement in photomask fabrication.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Yamauchi, "Quality assurance and yield improvement in photomask fabrication", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392029; https://doi.org/10.1117/12.392029
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