Resolution enhancement techniques and mask manufacturability for subwavelength lithography

Linard Karklin; Burn Jeng Lin

doi:10.1117/12.392103

19 July 2000 Resolution enhancement techniques and mask manufacturability for subwavelength lithography

Linard Karklin, Burn Jeng Lin

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392103
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

This paper analyzes two resolution enhancement techniques: alternating PSM and sub-resolution assists from the point of view of their applicability to manufacturing of integrated circuits of 130 nm a d below.

Citation Download Citation

Linard Karklin and Burn Jeng Lin "Resolution enhancement techniques and mask manufacturability for subwavelength lithography", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392103

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