19 July 2000 Spray developer for ZEP 7000
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Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392062
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan
Abstract
ZEP7000 has been successfully used as EB resist for high-end photomask manufacturing where high dry etching resistance, high sensitivity and high resolution are required. ZED-500 is the common developer use din spray development process and ZED-750 for puddle development process. These developers are designed to suite particularly for dry etching pattern profile. In this paper, we introduce a new developer, ZED- 450 which performs equivalent to ZED-500 while requiring either lower dosage or shorter development time in spray development process.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Atsushi Kawata, Atsushi Kawata, Kakuei Ozawa, Kakuei Ozawa, Nobunori Abe, Nobunori Abe, Kazuhide Yamashiro, Kazuhide Yamashiro, Takeshi Aizawa, Takeshi Aizawa, } "Spray developer for ZEP 7000", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392062; https://doi.org/10.1117/12.392062
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