23 February 2000 C-Ni multilayer reflectors: an AFM roughness study
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Proceedings Volume 4068, SIOEL '99: Sixth Symposium on Optoelectronics; (2000) https://doi.org/10.1117/12.378714
Event: SIOEL: Sixth Symposium of Optoelectronics, 1999, Bucharest, Romania
Abstract
Amorphous C-Ni superlattice films designed as normal- incidence reflector for 5 nm have been grown on quartz substrates by magnetron sputter deposition in Air discharge. An extended set of characterization techniques has been applied: Transmission Electron Microscopy (TEM) and Atomic Force Microscopy (AFM) in order to characterize the growth conditions. TEM measurements revealed information about the evolution of smoothness and the uniformity of the multilayer structure function of the distance of the substrate. A new DSP-controlled AFM system has been involved in investigating the surface topography of the final surface of the multilayer structure as well as the substrate. A new DSP- controlled AFM system has been involved in investigating the surface topography of the final surface of the multilayer structure as well as the substrate. A detailed analysis of AFM topographic images is presented. Special attention has been paid to an important parameter for such mirrors, the surface roughness, for nanometric and micrometric ares, invovling AFM tips with different radius of curvature. Roughness analysis as well as the implication of the different radius curvature tips use din AFM-contact experiments are presented together with the power spectral density function calculation.
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Magdalena Ulmeanu, G. Radu, P. Budau, Marius Enachescu, "C-Ni multilayer reflectors: an AFM roughness study", Proc. SPIE 4068, SIOEL '99: Sixth Symposium on Optoelectronics, (23 February 2000); doi: 10.1117/12.378714; https://doi.org/10.1117/12.378714
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