25 February 2000 Excimer laser surface processing of Si3N4 and AlN
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Proceedings Volume 4070, ALT '99 International Conference on Advanced Laser Technologies; (2000) https://doi.org/10.1117/12.378159
Event: ALT'99 International Conference: Advanced Laser Technologies, 1999, Potenza-Lecce, Italy
Abstract
We report on the investigation of XeF excimer laser ablation of YNi2B2C target by energy selective time-of-flight mass spectrometry (ES-TOFMS). ES-TOFMS allows laser plume investigation by providing a direct measurement of the ions kinetic energy and, through the TOF measurement, their simultaneous mass identification. In particular, the composition and the kinetic energy of the emitted ions has been accomplished by means of TOF technique coupled with a 160 degrees electrostatic energy analyzer. The analysis of the charged species composition and kinetic energy has been performed at different laser fluences and in high vacuum conditions.
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L. Yaghdjian, Gilbert Vacquier, Andre Fabre, Michel L. Autric, "Excimer laser surface processing of Si3N4 and AlN", Proc. SPIE 4070, ALT '99 International Conference on Advanced Laser Technologies, (25 February 2000); doi: 10.1117/12.378159; https://doi.org/10.1117/12.378159
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