25 February 2000 Pulsed laser deposition of thin films on large substrates
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Proceedings Volume 4070, ALT '99 International Conference on Advanced Laser Technologies; (2000) https://doi.org/10.1117/12.378157
Event: ALT'99 International Conference: Advanced Laser Technologies, 1999, Potenza-Lecce, Italy
Abstract
We have designed and built an ultra high vacuum chamber which allows thin film depositions on large area flat substrates and on 3D substrates by the pulsed laser deposition and reactive pulsed laser deposition techniques. Heating of substrates during and after film deposition is possible by using either resistive heaters or a lamp array. Metal and metal nitride and carbide were deposited on Si wafers, 3D steel substrates, teflon plates and paper sheets.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Acquaviva, S. Acquaviva, M. Fernandez, M. Fernandez, Gilberto Leggieri, Gilberto Leggieri, Armando Luches, Armando Luches, Maurizio Martino, Maurizio Martino, Alessio Perrone, Alessio Perrone, } "Pulsed laser deposition of thin films on large substrates", Proc. SPIE 4070, ALT '99 International Conference on Advanced Laser Technologies, (25 February 2000); doi: 10.1117/12.378157; https://doi.org/10.1117/12.378157
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