24 April 2000 Excimer laser decontamination
Author Affiliations +
Proceedings Volume 4071, International Conference on Atomic and Molecular Pulsed Lasers III; (2000) https://doi.org/10.1117/12.383456
Event: International Conference on Atomic and Molecular Pulsed Lasers III, 1999, Tomsk, Russian Federation
The application of excimer laser ablation process to the decontamination of radioactive surfaces is discussed. This technology is very attractive because it allows to efficiently remove the contaminated particles without secondary waste production. To demonstrate the capability of such technology to efficiently decontaminate large area, we studied and developed a prototype which include a XeCl laser, an optical fiber delivery system and an ablated particles collection cell. The main physical processes taking place during UV laser ablation will be explained. The influence of laser wavelength, pulse duration and absorption coefficient of material will be discussed. Special studies have been performed to understand the processes which limit the transmission of high average power excimer laser through optical fiber, and to determine the laser conditions to optimize the value of this transmission. An in-situ spectroscopic analysis of laser ablation plasma allows the real time control of the decontamination. The results obtained for painting or metallic oxides removal from stainless steel surfaces will be presented.
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Marc L. Sentis, Marc L. Sentis, Philippe Ch. Delaporte, Philippe Ch. Delaporte, Wladimir Marine, Wladimir Marine, Olivier P. Uteza, Olivier P. Uteza, } "Excimer laser decontamination", Proc. SPIE 4071, International Conference on Atomic and Molecular Pulsed Lasers III, (24 April 2000); doi: 10.1117/12.383456; https://doi.org/10.1117/12.383456

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