24 April 2000 Repetitively pulsed discharge plasma-controlled copper-vapor laser kinetics
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Proceedings Volume 4071, International Conference on Atomic and Molecular Pulsed Lasers III; (2000) https://doi.org/10.1117/12.383444
Event: International Conference on Atomic and Molecular Pulsed Lasers III, 1999, Tomsk, Russian Federation
Abstract
We have developed and tested a technique for controlling copper-vapor laser output parameters by superimposing a secondary repetitively pulsed discharge on a primary discharge with a controlled time delay. As the time delay is varied from tens of microseconds to several microseconds, the output energy and average power can be varied from 0 to 100%. A lasing management mechanism based on prescribed variations in the microcharacteristics of the discharge plasma is discussed.
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Anatoly N. Soldatov, Anatoly N. Soldatov, Andrey V. Lugovskoy, Andrey V. Lugovskoy, Yu. P. Polunin, Yu. P. Polunin, A. A. Fofanov, A. A. Fofanov, L. N. Chausova, L. N. Chausova, } "Repetitively pulsed discharge plasma-controlled copper-vapor laser kinetics", Proc. SPIE 4071, International Conference on Atomic and Molecular Pulsed Lasers III, (24 April 2000); doi: 10.1117/12.383444; https://doi.org/10.1117/12.383444
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