1 September 2000 Focused ion beam direct micromachining of DOEs
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Proceedings Volume 4075, Micro-Opto-Electro-Mechanical Systems; (2000) https://doi.org/10.1117/12.397932
Event: Symposium on Applied Photonics, 2000, Glasgow, United Kingdom
Abstract
We discuss here the capability of direct manufacture of various high- resolution diffractive optics, in particular regarding micromachining of DOEs in 3D. Preliminary demonstrations were made in 2-D using an automated FIB system operated at 30 KeV with a Gallium liquid metal ion source and equipped with a gas injection system (GIS). Gratings with a 20 nm line width and zone plates with 32 nm outer ring were milled in a reactive atmosphere (iodine) directly through 3.5 (mu) m and 800 nm of gold respectively. Plans for combining FIB and X-ray lithography to make diffractive optical elements (DOEs) for JPL are also mentioned.
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Chantal Khan Malek, Frank T. Hartley, Jayant Neogi, "Focused ion beam direct micromachining of DOEs", Proc. SPIE 4075, Micro-Opto-Electro-Mechanical Systems, (1 September 2000); doi: 10.1117/12.397932; https://doi.org/10.1117/12.397932
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