1 September 2000 Focused ion beam direct micromachining of DOEs
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Proceedings Volume 4075, Micro-Opto-Electro-Mechanical Systems; (2000) https://doi.org/10.1117/12.397932
Event: Symposium on Applied Photonics, 2000, Glasgow, United Kingdom
We discuss here the capability of direct manufacture of various high- resolution diffractive optics, in particular regarding micromachining of DOEs in 3D. Preliminary demonstrations were made in 2-D using an automated FIB system operated at 30 KeV with a Gallium liquid metal ion source and equipped with a gas injection system (GIS). Gratings with a 20 nm line width and zone plates with 32 nm outer ring were milled in a reactive atmosphere (iodine) directly through 3.5 (mu) m and 800 nm of gold respectively. Plans for combining FIB and X-ray lithography to make diffractive optical elements (DOEs) for JPL are also mentioned.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chantal Khan Malek, Frank T. Hartley, Jayant Neogi, "Focused ion beam direct micromachining of DOEs", Proc. SPIE 4075, Micro-Opto-Electro-Mechanical Systems, (1 September 2000); doi: 10.1117/12.397932; https://doi.org/10.1117/12.397932


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