Paper
30 June 2000 Study of 5-mask TFT array process with low-cost high-yield high-performance characteristics
Jr-Hong Chen, Ting-Hui Huang, I-Min Lu, Pi-Fu Chen, Dou-I Chen
Author Affiliations +
Abstract
Three types of 5-mask TFT array process have been compared and analyzed their characteristics including TFT performance, process window, etc. Results showing here indicate that a 5-mask TFT manufacturing process can be optimized with low cost, high production yield and high performance. These properties let the reduced mask TFT array process reveal a much higher potential in mass production.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jr-Hong Chen, Ting-Hui Huang, I-Min Lu, Pi-Fu Chen, and Dou-I Chen "Study of 5-mask TFT array process with low-cost high-yield high-performance characteristics", Proc. SPIE 4079, Display Technologies III, (30 June 2000); https://doi.org/10.1117/12.389408
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Cited by 1 scholarly publication.
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KEYWORDS
Array processing

Metals

Manufacturing

Etching

Amorphous silicon

Electrodes

Silicon films

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