Optical and thermal properties of SiNx for MO disks

Chih-Huang Lai; Chang-Lin Huang; Chun-Yu Hsu; I-Nan Lin; JwoHuei Jou

doi:10.1117/12.390516

6 July 2000 Optical and thermal properties of SiN_x for MO disks

Chih-Huang Lai, Chang-Lin Huang, Chun-Yu Hsu, I-Nan Lin, JwoHuei Jou

Proceedings Volume 4081, Optical Storage and Optical Information Processing; (2000) https://doi.org/10.1117/12.390516
Event: Photonics Taiwan, 2000, Taipei, Taiwan

Abstract

SiN_x films were prepared by rf reactively sputtering. The refractive index of SiN_x films was affected by total pressure and sputtering power. When the total pressure increased, the refractive index decreased. The reduction of sputtering power showed similar effect to raise the total gas pressure. The residual stress and roughness of SiN_x films depended on the total pressure, sputtering power, and the thickness. The thermal cycles may result in irreversible change of residual stress of SiN_x film. The magnetic properties of TbFeCo depended on the residual stress and roughness of SiN_x in the trilayer SiN_x/TbFeCo/SiN_x samples. The coercivity of TbFeCo was enhanced in the samples with SiN_x films having low stress and large roughness.

Citation Download Citation

Chih-Huang Lai, Chang-Lin Huang, Chun-Yu Hsu, I-Nan Lin, and JwoHuei Jou "Optical and thermal properties of SiN_x for MO disks", Proc. SPIE 4081, Optical Storage and Optical Information Processing, (6 July 2000); https://doi.org/10.1117/12.390516

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