29 November 2000 Effect of heat treatment condition for protecting film on discharge characteristics of ac PDP
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Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408292
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
With MgO film as an example, the effect of different heat treatment conditions in preparation of protecting film overcoating the dielectric layer in AC PDP (Plasma Display Panel) prepared by electron-beam evaporation method on the performance of AC PDP are thoroughly studied and discussed. The studied baking condition mainly focuses on treating atmosphere, air, vacuum, and inert gases atmosphere are considered. And also this observed dependence of the discharge characteristics on heat treatment condition of panel fabrication process is explained in terms of a postulated effect of oxygen on the surface properties of MgO films and the changes in the surface properties of MgO films produced by ion bombardment during discharge.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hongxia Ren, Yue Hao, "Effect of heat treatment condition for protecting film on discharge characteristics of ac PDP", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408292; https://doi.org/10.1117/12.408292
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