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29 November 2000 Fabrication and structure characterization of molecular deposition films
Qiangbin Wang; Hongchen Gu; Manglai Gao; Siwei Zhang
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Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408363
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
Molecular Deposition (MD) is a new kind of nanometer ultrathin film, which is made by electrostatic attraction between opposite charges from cationic and anionic compounds. The fabrication and structure characterization of four different molecular deposition films, monolayer MD film, bilayer MD film, trilayer MD film and tetralayer MD film, were reported in this paper. According to the topography analysis of the clear Au substrate and monolayer MD film by atomic force microscope and to the element content results of the four different MD films by X-ray Photoelectron Spectroscopy, the depositing process of MD film is illustrated to be deposited by monolayer. The authors first put forward to calculate the charge distribution in the molecular of the MD film with ab initial calculation, and the results first theoretically explain why the depositing process of MD film is deposited by monolayer.
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Qiangbin Wang, Hongchen Gu, Manglai Gao, and Siwei Zhang "Fabrication and structure characterization of molecular deposition films", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408363
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