Influence of preparation parameters of protecting film on discharge characteristics in ac PDP

Hongxia Ren; Yue Hao

doi:10.1117/12.408483

29 November 2000 Influence of preparation parameters of protecting film on discharge characteristics in ac PDP

Hongxia Ren, Yue Hao

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408483
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

With MgO film as an example, the effect of different technical parameters in preparation of protecting film overcoating the dielectric layer in AC PDP (Plasma Display Panel) by electron-beam evaporation method on the performance of AC PDP are thoroughly studied and discussed in this paper. These parameters explored include the substrate temperature, the deposition rate, etc. The relation between the composition, the crystal structure, the appearance of protecting film and emissive properties is researched, and their influence on the properties of AC PDP is also studied, the optimal process of preparing film is examined. And also this observed dependence of the discharge characteristics on the various parameters of the panel fabrication process is explained in terms of a postulated effect of oxygen on the surface properties of MgO films and the changes in the surface properties of the MgO films produced by ion bombardment during the discharge.

Citation Download Citation

Hongxia Ren and Yue Hao "Influence of preparation parameters of protecting film on discharge characteristics in ac PDP", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408483

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