29 November 2000 New way of preparing ion barrier ultrathin film without pollution
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Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408290
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
A new technology and method preparing ions barrier film on the input face of multi-hole substratum, MCP, without carbon pollution were studied and introduced in this paper. The composition of the film and the performance of MCP coated with ion barrier film were tested by XPS and UV photoelectric emission method. The new process made the carbon content largely decrease in the film, and the characteristics of MCP unmodified.
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Qingduo Duanmu, Delong Jiang, Yaohua Lu, Ye Li, Lichen Fu, Jingquan Tian, "New way of preparing ion barrier ultrathin film without pollution", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408290; https://doi.org/10.1117/12.408290
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