29 November 2000 Preparation and properties of scratch-resistant nanoporous broadband AR silica films derived by a two-step catalytic sol-gel process
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Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408386
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
A new method to strengthen nano porous broadband anti- reflectance silica films is described. Silica sols were made from TEOS with a base/acid two-step catalytic process. Properties of silica films deposited with a dip-coat method are characterized with AFM, SEM, spectrophotometer and abrasion test. Experimental results show that an average reflectance of a glass coated with the nano porous silica films is less than 1% in the visible region; and that the two-step catalysis obviously strengthens the films. Finally, the strengthening mechanism of the films is discussed.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guangming Wu, Guangming Wu, Jue Wang, Jue Wang, Shen Jun, Shen Jun, Tianhe Yang, Tianhe Yang, Qinyuan Zhang, Qinyuan Zhang, Bin Zhou, Bin Zhou, Zhongsheng Deng, Zhongsheng Deng, Bin Fan, Bin Fan, Dongping Zhou, Dongping Zhou, Fengshan Zhang, Fengshan Zhang, } "Preparation and properties of scratch-resistant nanoporous broadband AR silica films derived by a two-step catalytic sol-gel process", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408386; https://doi.org/10.1117/12.408386
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