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29 November 2000 Structural, infrared, x-ray photoelectron, and Raman spectral characterization of electrochromic nickel oxide films
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Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408487
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
Nickel oxide films were deposited onto indium-tin oxide coated substrates by electron-beam evaporation and were electrochemically colored and bleached in KOH electrolyte. X-ray diffraction, infrared, x-ray photoelectronic and Raman spectroscopy were used to characterize the films. Results show that the as-deposited films are composed of crystallites with preferential orientation of cubic NiO(111), and retain their original structure after electrochromic redox reaction. The boundary and surface of the NiO crystallites play a critical role in the electrochromic reaction, the sites of the injection and ejection of OH- ions and relevant electrochromic reaction are at the interface of NiO crystallites, the major composition at the interfaces of the crystallites are NiO for the as-deposited films, NiOOH for the colored films and Ni(OH)2 for the bleached films.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yonggang Wu, Guangming Wu, Xingyuan Ni, and Xiang Wu "Structural, infrared, x-ray photoelectron, and Raman spectral characterization of electrochromic nickel oxide films", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408487
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