29 November 2000 Surface texturing of crystalline silicon and effective area measurement
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Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408408
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
In this paper, the surface area of solar cell is determined by the capacitance measurements of MOS structure. The texture etching technology can be controlled according to the change of silicon surface area, furthermore, the textured silicon surface and interface characteristic of solar cell can be studied by measuring the relationship of capacitance and voltage for MOS structure.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tietun Sun, Dong Chen, Rongqiang Chui, "Surface texturing of crystalline silicon and effective area measurement", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); doi: 10.1117/12.408408; https://doi.org/10.1117/12.408408
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