Multiple-channel InGaAs/InGaAsP electro-absorption intensity modulator fabricated using low-energy-phosphorus-ion-implantation-induced intermixing

Seng Lee Ng; Hwi Siong Lim; Boon Siew Ooi; Yee Loy Lam; Yan Zhou; Yuen Chuen Chan; Vincent Aimez; Jacques Beauvais; Jean Beerens

doi:10.1117/12.406442

15 December 2000 Multiple-channel InGaAs/InGaAsP electro-absorption intensity modulator fabricated using low-energy-phosphorus-ion-implantation-induced intermixing

Seng Lee Ng, Hwi Siong Lim, Boon Siew Ooi, Yee Loy Lam, Yan Zhou, Yuen Chuen Chan, Vincent Aimez, Jacques Beauvais, Jean Beerens

Author Affiliations +

Proceedings Volume 4087, Applications of Photonic Technology 4; (2000) https://doi.org/10.1117/12.406442
Event: 2000 International Conference on Application of Photonic Technology (ICAPT 2000), 2000, Quebec City, Canada

Abstract

A new quantum-well intermixing process in InGaAs-InGaAsP structures, based on controlled low energy phosphorus (P) ion implantation, has been employed in the fabrication of multiple wavelength selective channel electroabsorption (EA) intensity modulators. These modulators, fabricated on a single chip, have an intensity modulation depth as high as -1 1 dB for voltage swings as low as -6 V.

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Seng Lee Ng, Hwi Siong Lim, Boon Siew Ooi, Yee Loy Lam, Yan Zhou, Yuen Chuen Chan, Vincent Aimez, Jacques Beauvais, and Jean Beerens "Multiple-channel InGaAs/InGaAsP electro-absorption intensity modulator fabricated using low-energy-phosphorus-ion-implantation-induced intermixing", Proc. SPIE 4087, Applications of Photonic Technology 4, (15 December 2000); https://doi.org/10.1117/12.406442

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