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15 December 2000 Role of photomask resolution on the performance of arrayed-waveguide grating devices
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Proceedings Volume 4087, Applications of Photonic Technology 4; (2000)
Event: 2000 International Conference on Application of Photonic Technology (ICAPT 2000), 2000, Quebec City, Canada
The crosstalk performance of an arrayed-waveguide grating (AWG) multi-/demultiplexer is primarily caused by random optical phase errors introduced in the arrayed-waveguides. Since the layout of waveguides on a wafer is patterned by photomask through photolithography process, the resolution of a photomask has a direct influence on the phase errors of an AWG. This paper presents a theoretical analysis on the phase error caused by photomask resolution along with other basic design parameters. Both calculation and measurement results show that a high-resolution photomask (better than 25 nm) is a critical requirement to produce low-crosstalk (less than -30 dB) AWG demultiplexers. We also investigated the non-ideal power distribution in the array waveguides since it contributes considerable phase errors when material impurity is not well controlled during wafer fabrication. Basic criteria of power profile truncation, number of grating waveguides, and material index variation are summarized in this paper as well.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wei Chen, Chau-Han Lee, Qiang Wang, Yung Jui Chen, Warren T. Beard, Dennis Stone, Robert F. Smith, Rod Mincher, and Ian R. Stewart "Role of photomask resolution on the performance of arrayed-waveguide grating devices", Proc. SPIE 4087, Applications of Photonic Technology 4, (15 December 2000);

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