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6 November 2000 Evaluation of characteristics of VUV optical materials irradiated by F2 laser
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Proceedings Volume 4088, First International Symposium on Laser Precision Microfabrication; (2000) https://doi.org/10.1117/12.405748
Event: First International Symposium on Laser Precision Microfabrication (LPM2000), 2000, Omiya, Saitama, Japan
Abstract
The F2 Laser (wavelength 157nm) is becoming the most promising candidate of light source for next generation optical micro-lithography below the 100nm-technology node. We have developed VUV optics evaluation system, which is able to measure the transmittance between DUV and VUV region right after laser irradiation and the temporal transmittance during 157nm-laser irradiation. This system structured by Ni-plated Aluminum and stainless steel. The inside of chamber is purged of any laser light absorption gas away with high purity nitrogen gas during the irradiation. Using this system, we can measure the characteristics of the irradiated sample without exposing to the air of other contamination sources. So this system has +/- 0.5% accuracy result in repeated measurement. In the in-situ transmittance measure system, the transmittance can be monitored during F2 laser irradiation. And we evaluated characteristics of VUV optical materials in the early period of F2 laser irradiation by this in-situ transmittance measure system.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuo Itakura, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Osamu Wakabayashi, and Hakaru Mizoguchi "Evaluation of characteristics of VUV optical materials irradiated by F2 laser", Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); https://doi.org/10.1117/12.405748
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