6 November 2000 Preparation of metal oxide thin films using coating photolysis process with ArF excimer laser
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Proceedings Volume 4088, First International Symposium on Laser Precision Microfabrication; (2000) https://doi.org/10.1117/12.405721
Event: First International Symposium on Laser Precision Microfabrication (LPM2000), 2000, Omiya, Saitama, Japan
Abstract
The preparation of metal oxide thin films have been developed using the metalorganic (MO) compounds coating photolysis process with ArF excimer laser irradiation at room temperature. The effect of the starting materials and irradiation method on the product films was investigated by FT-IR, UV, XRD and SEM. It was found that metal acetylacetonates or metal 2-ethylhexanoate was effective as the starting materials. When using metal acetylacetonates as the starting materials, crystallized TiO2, In2O3 and ZrO2 were obtained with ArF laser irradiation at 50 mJ/cm2 at a repetition rate of 5 Hz for 5 min. When using An-acac, Fe, Sn, or In 2-ethylhexanoate as the starting material, a two-step process consisting of both preliminary weak (10mJ/cm2) and sufficiently strong irradiation (50mJ/cm2) was found to be effective for obtaining crystallized ZnO, Fe2O3, SnO2 and In2O3 films. In addition, crystallized complex oxide thin films such as ITO, PbTo3 and PbZrO3 were successfully obtained from the metal acetylacetonates or metal 2-ethylhexanoate using MO coating photolysis process. Patterned metal oxide thin films were also obtained by the ArF laser irradiation through the photomask, followed by leaching with solvents. The crystallization mechanism was discussed from the point of view of the photochemical reaction and photothermal reaction.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tetsuo Tsuchiya, Akio Watanabe, Yoji Imai, Hiroyuki Niino, Akira Yabe, Iwao Yamaguchi, Takaaki Manabe, Toshiya Kumagai, Susumu Mizuta, "Preparation of metal oxide thin films using coating photolysis process with ArF excimer laser", Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); doi: 10.1117/12.405721; https://doi.org/10.1117/12.405721
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