6 November 2000 Thermomechanical mechanisms of laser cleaning
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Proceedings Volume 4088, First International Symposium on Laser Precision Microfabrication; (2000) https://doi.org/10.1117/12.405745
Event: First International Symposium on Laser Precision Microfabrication (LPM2000), 2000, Omiya, Saitama, Japan
Abstract
The physical mechanisms of dry and steam laser cleaning of the surface are investigated theoretically. At dry laser cleaning particles are removed from the surface due to inertial force that caused by particles and/or substrate thermal expansion by light absorption and thermal conduction. The condition of complete particle removal, when it does not return to the substrate, is defined. The considered physical mechanism of dry laser cleaning is propagated to multipulse regime. The physical mechanisms of steam laser cleaning are proposed to be caused by liquid layer vaporization near the particle surface due to substrate and/or particle light absorption and non-uniform action of vapor pressure to the particles. The evaluated thresholds of dry and steam laser cleaning are in a good agreement with known experimental data.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vadim P. Veiko, Elena A. Shakhno, Sergey V. Nikolaev, "Thermomechanical mechanisms of laser cleaning", Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); doi: 10.1117/12.405745; https://doi.org/10.1117/12.405745
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