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31 October 2000 Production of thin film optical coatings with predetermined stress levels
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In this investigation a technique was developed for depositing high reflectors of alternating layers of TiO2 and SiO2 with varying levels of stress. The TiO2 layers were deposited by ion assisted electron beam evaporation, and the SiO2 layers by modulated reactive DC magnetron sputtering. The TiO2 layers were in tensile stress, and the stress depended on the ion beam current density. The SiO2 layers were in compressive stress. The total stress in the high reflector coating was controlled by the ion beam current density applied during deposition of the TiO2 films. The coatings were deposited at a substrate temperature of approximately 50 degrees Celsius. Coating stress levels were unaffected by changes in relative humidity. The stability of the coating over time depended on the density of the TiO2 layers.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David W. Reicher and Samuel A. McCormack "Production of thin film optical coatings with predetermined stress levels", Proc. SPIE 4091, Imaging Technology and Telescopes, (31 October 2000);

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