2 October 2000 Method of microlens array fabricated by inorganic photoresist
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Abstract
It has been shown that it is possible to fabricate very small lenses by melting islands of inorganic photoresist on a glass substrate. The inorganic photoresist composited in our laboratory is suitable to be exposed by Electron Beam (EBE) or X-Ray. We have obtained the lithophotography pattern with 0.6 micrometers line width by EGE exposure. Because the resist pattern will not swell and distort during the processing, there is no problem of shelf life. We have made lenses with diameter from 0.8 mm to 1.0 mm, in the form of spheres, and have studied their optical properties.
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Changtai Yu, Hong Zhang, Fangfu Guo, Ying Chen, Jianjun Wu, Hua Yu, "Method of microlens array fabricated by inorganic photoresist", Proc. SPIE 4092, Novel Optical Systems Design and Optimization III, (2 October 2000); doi: 10.1117/12.402421; https://doi.org/10.1117/12.402421
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