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Development of an automated optical system for the analysis of etch pits density and distribution on semiconductor materials
Multiscale mapping technique for the simultaneous estimation of absorption and partial scattering of optical coatings
Methods, error influences, and limits for the ultraprecise measurement of slope and figure for large, slightly nonflat, or steep complex surfaces
Rotating compensator spectroscopic ellipsometry (RCSE) and its application to high-k dielectric film HfO2
Spectrophotometric determination of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films