Paper
15 December 2000 Quantum well infrared photodetector (λ=3-20 μm) focal plane arrays: monolithic integration with Si-based readout-integrated circuitry for low cost and high performance
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Abstract
Results of detector characterization are presented for quantum well infrared photodetectors (QWIPs) fabricated from a variety of III-V material systems lattice-matched to InP substrate. Extremely large responsivities of 33.2 A/W were obtained from GaInAs/InP QWIPs operating at (lambda) equals 9 micrometers which represents to the authors' knowledge the largest value of responsivity for any QWIP in this wavelength range. Devices made from AlGaInAs/InP and GaInAs/AlInAs have also been realized that extend the wavelength range of sensitivity from 3 micrometers out to 20 micrometers while remaining lattice-matched to InP. Lattice-matched multispectral detectors are demonstrated for sensitivity at both 4 micrometers and 8.5 micrometers . Localized epitaxy of GaInAs/InP superlattice structures lattice-matched to InP was performed on Si substrate for the purpose of monolithic integration of III-V QWIPs with Si-based readout integrated circuitry.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Manijeh Razeghi, Matthew Erdtmann, Christopher Louis Jelen, Jacqueline E. Diaz, F. Guastavinos, Gail J. Brown, and Yoon-Soo Park "Quantum well infrared photodetector (λ=3-20 μm) focal plane arrays: monolithic integration with Si-based readout-integrated circuitry for low cost and high performance", Proc. SPIE 4130, Infrared Technology and Applications XXVI, (15 December 2000); https://doi.org/10.1117/12.409875
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Cited by 2 scholarly publications.
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KEYWORDS
Quantum well infrared photodetectors

Sensors

Silicon

Quantum wells

Lithium

Epitaxy

Absorption

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