26 October 2000 MEMS technology at NASA's Jet Propulsion Laboratory
Author Affiliations +
The MEMS Technology Group is part of the Microdevices Laboratory (MDL) at the Jet Propulsion Laboratory (JPL). The group pursues the development of a wide range of advanced MEMS technologies that are primarily applicable to NASA's robotic as well as manned exploration missions. Thus these technologies are ideally suited for the demanding requirements of space missions namely, low mass, low power consumption and high reliability, without significant loss of capability. End-to-end development of these technologies is conducted at the MDL, a 38,000 sq. ft. facility with approximately 5500 sq. ft. each of cleanroom (class 10 - 100,000) and characterization laboratory space. MDL facilities include computer design and simulation tools, optical and electron-beam lithography, thin film deposition equipment, dry and wet etching facilities including Deep Reactive Ion Etching, device assembly and testing facilities. Following the fabrication of the device prototypes, reliability testing of these devices is conducted at the state-of-the-art Failure Analysis Laboratory at JPL.
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Thomas George, Thomas George, Sam Young Bae, Sam Young Bae, Indrani Chakraborty, Indrani Chakraborty, Hillary Cherry, Hillary Cherry, Christopher Evans, Christopher Evans, Beverley Eyre, Beverley Eyre, Amanda A. Green, Amanda A. Green, Allan Hui, Allan Hui, Kevin King, Kevin King, H. Lynn Kim, H. Lynn Kim, Russell A. Lawton, Russell A. Lawton, Gisela Lin, Gisela Lin, Colleen Marrese, Colleen Marrese, Juergen Mueller, Juergen Mueller, Judith A. Podosek, Judith A. Podosek, Kirill Shcheglov, Kirill Shcheglov, Tony K. Tang, Tony K. Tang, Thomas R. VanZandt, Thomas R. VanZandt, Stephen E. Vargo, Stephen E. Vargo, Joanne Wellman, Joanne Wellman, Victor White, Victor White, Dean V. Wiberg, Dean V. Wiberg, Eui-Hyeok Yang, Eui-Hyeok Yang, } "MEMS technology at NASA's Jet Propulsion Laboratory", Proc. SPIE 4134, Photonics for Space Environments VII, (26 October 2000); doi: 10.1117/12.405340; https://doi.org/10.1117/12.405340

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