High-uniformity collimator for x-ray proximity lithography

Webster C. Cash

doi:10.1117/12.405897

2 November 2000 High-uniformity collimator for x-ray proximity lithography

Webster C. Cash

Proceedings Volume 4144, Advances in Laboratory-based X-Ray Sources and Optics; (2000) https://doi.org/10.1117/12.405897
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

An x-ray optic suitable for use in x-ray proximity lithography is described. It employs multiple flat mirror facets arranged at grazing incidence, each of which creates an optically independent channel that covers the entire target. The facets are arranged so that many channels can simultaneously illuminate the target, thereby achieving high flux at the target with high uniformity. We report laboratory testing that shows uniformity better than +/- 0.4% across 40 mm at 1 keV.

Citation Download Citation

Webster C. Cash "High-uniformity collimator for x-ray proximity lithography", Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); https://doi.org/10.1117/12.405897

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