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2 November 2000 High-uniformity collimator for x-ray proximity lithography
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Abstract
An x-ray optic suitable for use in x-ray proximity lithography is described. It employs multiple flat mirror facets arranged at grazing incidence, each of which creates an optically independent channel that covers the entire target. The facets are arranged so that many channels can simultaneously illuminate the target, thereby achieving high flux at the target with high uniformity. We report laboratory testing that shows uniformity better than +/- 0.4% across 40 mm at 1 keV.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Webster C. Cash "High-uniformity collimator for x-ray proximity lithography", Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); https://doi.org/10.1117/12.405897
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